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Oxides that can be used as transparent electrodes and to control pixels without compromising the visual information of the screen!
■ Each Ratios (90:10; 95:5; 97:3) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.
We deliver target materials for PVD and materials for vacuum deposition in small quantities and with short lead times!
We would like to introduce the "sputtering" products we handle. For target materials, the maximum size for planar types is 2200mm x 2500mm, and for rotary types, it is up to 3800mm in length. We handle various materials, but we are particularly confident in our ability to supply materials that are currently difficult to obtain, such as Hf, Zr, Ta, Nd, Sc, and Sm. 【Benefits of Using Our Products】 ■ Smooth procurement of hard-to-obtain materials ■ Bonding processing support is also available *For more details, please download the PDF or feel free to contact us.
About sputtering target materials
We offer a variety of sputtering targets, including Cr, Ti, CrAl, WC, and many other materials. We can also accommodate different shapes and dimensions, such as round, plate, and rod shapes, according to our customers' needs. We look forward to your requests.
